发明名称 反射型マスクブランク及びその製造方法、反射型マスク
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a reflective mask blank with a light-shielding frame having a high level of light-shielding power, and its manufacturing method, and a reflective mask and its manufacturing method. <P>SOLUTION: The reflective mask blank of the present invention comprises: a substrate 11; a multilayered reflective layer 21 formed on a surface of the substrate; and an absorber layer 51 formed on the multilayered reflective layer 21. The method for manufacturing a reflective mask comprises the step of providing a fine rugged pattern on the substrate 11 before the manufacture of the mask blank. Thus, the intensity of reflection caused by the multilayered reflective layer 21 is reduced by a phase effect in use as a reflective mask, and a light-shielding frame having a high level of light-shielding power can be fabricated. <P>COPYRIGHT: (C)2012,JPO&INPIT</p>
申请公布号 JP5742300(B2) 申请公布日期 2015.07.01
申请号 JP20110043883 申请日期 2011.03.01
申请人 发明人
分类号 H01L21/027;G03F1/24;G03F1/46 主分类号 H01L21/027
代理机构 代理人
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