发明名称 半導体装置
摘要 <p>A semiconductor device includes a first semiconductor layer, a second semiconductor layer, a two-dimensional carrier gas layer, a first main electrode, a second main electrode, a first gate electrode, and a second gate electrode. The first gate electrode is provided between a part of the first main electrode and a part of the second main electrode opposite to the part of the first main electrode. The second gate electrode is provided between another part of the first main electrode and another part of the second main electrode opposite to the another part of the first main electrode with a separation region interposed between the first gate electrode and the second gate electrode. The second gate electrode is controlled independently of the first gate electrode.</p>
申请公布号 JP5742159(B2) 申请公布日期 2015.07.01
申请号 JP20100225438 申请日期 2010.10.05
申请人 发明人
分类号 H01L21/338;H01L27/095;H01L29/778;H01L29/812 主分类号 H01L21/338
代理机构 代理人
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