| 摘要 |
<p>The present invention relates to a chemical tank for a substrate processing apparatus. The chemical tank includes a tank body of storing a chemical, an overflow pipe which overflows the chemical stored by the external insertion of the tank body, a height control pipe which is combined with the end of the overflow pipe in the tank body and can control its height. The present invention includes a height control unit controls the height of the overflow pipe inserted into the tank body, can control the height of the overflow as needed. Therefore, the maximum water level of the chemical tank can be more easily and quickly controlled.</p> |
