| 摘要 |
<p>The present invention relates to a circulation type refining device for a process chamber. The circulation type refining device includes: a process chamber for mounting a substrate and processing the substrate in an inert atmosphere; an inert gas supply pipe which supplies inert gas to the process chamber; an exhaust pipe which exhausts gas from the process chamber to the outside; a heating part which is prepared in the inert gas supply pipe, heats the inert gas supplied to the process chamber, and improves moisture removal efficiency; a sensor part which detects moisture concentration of the gas exhausted through the exhaust pipe, and checks the internal atmosphere of the process chamber; a blower part which is prepared in the exhaust pipe, and cools and circulates the gas; and a refining column which removes moisture and foreign substances in the gas circulated by the blower part and supplies the gas to the inert gas supply pipe. The consumption of the inert gas can be minimized by refining the gas in the process chamber and the inert gas exhausted with the gas, and re-circulating the gas and the inert gas.</p> |
