发明名称 Display device
摘要 One object is to provide a transistor including an oxide semiconductor film which is used for the pixel portion of a display device and has high reliability. A display device has a first gate electrode; a first gate insulating film over the first gate electrode; an oxide semiconductor film over the first gate insulating film; a source electrode and a drain electrode over the oxide semiconductor film; a second gate insulating film over the source electrode, the drain electrode and the oxide semiconductor film; a second gate electrode over the second gate insulating film; an organic resin film having flatness over the second gate insulating film; a pixel electrode over the organic resin film having flatness, wherein the concentration of hydrogen atoms contained in the oxide semiconductor film and measured by secondary ion mass spectrometry is less than 1×1016 cm−3.
申请公布号 US9070596(B2) 申请公布日期 2015.06.30
申请号 US201414154534 申请日期 2014.01.14
申请人 Semiconductor Energy Laboratory Co., Ltd. 发明人 Yamazaki Shunpei
分类号 H01L29/12;H01L27/12;H01L29/786 主分类号 H01L29/12
代理机构 Fish & Richardson P.C. 代理人 Fish & Richardson P.C.
主权项 1. A display device comprising: a first gate electrode; a first gate insulating film over the first gate electrode; an intrinsic or substantially intrinsic oxide semiconductor film over the first gate insulating film; a source electrode and a drain electrode in contact with the oxide semiconductor film; a second gate insulating film over the source electrode, the drain electrode and the oxide semiconductor film; a second gate electrode over the second gate insulating film; and an organic resin film over the second gate insulating film, wherein the organic resin film does not overlap the second gate electrode, wherein a relation of Ec−Ef<Eg/2 is satisfied where Eg is a band gap of the oxide semiconductor film, Ec is an energy at a bottom of a conduction band of the oxide semiconductor film, and Ef is a Fermi energy of the oxide semiconductor film.
地址 Atsugi-shi, Kanagawa-ken JP