发明名称 Aluminum electroplating solution and method for forming aluminum plating film
摘要 An object of the present invention is to provide an extended-life plating solution that allows an aluminum electroplating process to be performed stably for a long period of time, and also a method for forming an aluminum plating film using the same. An aluminum electroplating solution according to the present invention is characterized by comprising 1.5 to 4.0 mol of an aluminum halide per 10.0 mol of dimethyl sulfone and, relative to the aluminum halide, ammonium chloride in a molar ratio of 1/15 to 1/4 or a tetraalkylammonium chloride in a molar ratio of 1/15 to 1/2. The plating solution has improved electrical conductivity and thus has a further advantage in that it allows the formation of a uniform aluminum plating film on a substrate to be plated even when the plating process is performed by a barrel method.
申请公布号 US9068270(B2) 申请公布日期 2015.06.30
申请号 US200913123760 申请日期 2009.07.31
申请人 HITACHI METALS, LTD. 发明人 Hoshi Hiroyuki;Okamoto Atsushi
分类号 C25D3/66;C25D3/56;C25D3/00;C25D3/44 主分类号 C25D3/66
代理机构 Kratz, Quintos & Hanson, LLP 代理人 Kratz, Quintos & Hanson, LLP
主权项 1. An aluminum electroplating solution comprising 1.5 to 4.0 mol of an aluminum halide per 10.0 mol of dimethyl sulfone and, relative to the aluminum halide, ammonium chloride in a molar ratio of 1/15 to 1/4 or a tetraalkylammonium chloride in a molar ratio of 1/15 to 1/2.
地址 Tokyo JP