Semiconductor device including a thin film transistor and a capacitor

摘要

A semiconductor device and a method for preparing the same that can solve crack of a semiconductor film, capacitance electrodes and the like due to stress when forming a source electrode and a drain electrode in a semiconductor device having a thin film transistor and a holding capacitance with three or more capacitance electrodes is provided. Before forming the source electrode and the drain electrode, a crystalline silicon film for relaxing the stress is formed, then a contact hole connecting to the semiconductor film of the thin film transistor is opened, and a metal film to be the source electrode and the drain electrode is formed.

主权项

1. A semiconductor device comprising:
a first shielding film; a thin film transistor over the first shielding film, the thin film transistor comprising a gate electrode, a source electrode, and a drain electrode; a capacitor element comprising a first electrode, a second electrode and a third electrode; a second shielding film overlapping with the capacitor element; and a pixel electrode over the second shielding film, the pixel electrode overlapping with the capacitor element, wherein each of the source electrode and the drain electrode overlaps with the gate electrode, wherein the second shielding film is arranged in a reticulation pattern, wherein the first electrode is formed from a first conductive layer, and wherein the first conductive layer comprises a semiconductor film doped with an impurity element, wherein the source electrode and the drain electrode are formed from a second conductive layer, wherein the second electrode is formed from the second conductive layer, and wherein each of the gate electrode and the third electrode is formed from a third conductive layer.