发明名称 |
Mask and optical filter manufacturing apparatus including the same |
摘要 |
A mask and an optical filter manufacturing apparatus having the same are provided. The optical filter manufacturing apparatus includes a roll used in a roll-to-roll process, a base film wound around the roll, a light source that generates light for exposure, a polarizing plate that is installed at an emission side of the light source and polarizes light generated from the light source, and a mask that causes a pattern to be formed on the base film and includes a plurality of guide slits that are opened to have a predetermined thickness and a predetermined width. According to the present invention, the entire surface of the base film can be irradiated with a uniform light quantity. Thus, a pattern can be uniformly formed on the base film, the quality of a product can be improved, and the characteristics of the base film can be accurately realized. |
申请公布号 |
US9069257(B2) |
申请公布日期 |
2015.06.30 |
申请号 |
US201113393522 |
申请日期 |
2011.07.26 |
申请人 |
LG CHEM, LTD. |
发明人 |
Kim Sin Young;Hong Kyung Ki;Yoon Hyuk;Ju Won Cheul;Cho Yong Il;Park Moon Soo;Ko Dong Ho;Ryu Su Young |
分类号 |
G02F1/1337;G03B27/02;G03B27/10;G03B27/72;G03F1/42;G02B5/20;G02F1/13;G03F7/00;G03F7/24 |
主分类号 |
G02F1/1337 |
代理机构 |
McKenna Long & Aldridge LLP |
代理人 |
McKenna Long & Aldridge LLP |
主权项 |
1. An optical filter manufacturing apparatus, comprising:
a roll used in a roll-to-roll process; a base film wound around the roll; a light source that generates light for exposure; a polarizing plate that is installed at an emission side of the light source and polarizes light generated from the light source; and a mask that causes a pattern to be formed on the base film and includes a plurality of guide slits that are opened to have a predetermined thickness and a predetermined width, wherein surfaces of the mask and the base film facing each other are curved surfaces, wherein the width of the guide slit is the same as a unit pixel width of a stereoscopic video display device, and wherein the guide slit is designed to satisfy the following equation:
t≧5a where t represents the thickness of the guide slit, a represents an interval between the mask and the base film, and 0<a≦50 mm. |
地址 |
Seoul KR |