发明名称 Mask and optical filter manufacturing apparatus including the same
摘要 A mask and an optical filter manufacturing apparatus having the same are provided. The optical filter manufacturing apparatus includes a roll used in a roll-to-roll process, a base film wound around the roll, a light source that generates light for exposure, a polarizing plate that is installed at an emission side of the light source and polarizes light generated from the light source, and a mask that causes a pattern to be formed on the base film and includes a plurality of guide slits that are opened to have a predetermined thickness and a predetermined width. According to the present invention, the entire surface of the base film can be irradiated with a uniform light quantity. Thus, a pattern can be uniformly formed on the base film, the quality of a product can be improved, and the characteristics of the base film can be accurately realized.
申请公布号 US9069257(B2) 申请公布日期 2015.06.30
申请号 US201113393522 申请日期 2011.07.26
申请人 LG CHEM, LTD. 发明人 Kim Sin Young;Hong Kyung Ki;Yoon Hyuk;Ju Won Cheul;Cho Yong Il;Park Moon Soo;Ko Dong Ho;Ryu Su Young
分类号 G02F1/1337;G03B27/02;G03B27/10;G03B27/72;G03F1/42;G02B5/20;G02F1/13;G03F7/00;G03F7/24 主分类号 G02F1/1337
代理机构 McKenna Long & Aldridge LLP 代理人 McKenna Long & Aldridge LLP
主权项 1. An optical filter manufacturing apparatus, comprising: a roll used in a roll-to-roll process; a base film wound around the roll; a light source that generates light for exposure; a polarizing plate that is installed at an emission side of the light source and polarizes light generated from the light source; and a mask that causes a pattern to be formed on the base film and includes a plurality of guide slits that are opened to have a predetermined thickness and a predetermined width, wherein surfaces of the mask and the base film facing each other are curved surfaces, wherein the width of the guide slit is the same as a unit pixel width of a stereoscopic video display device, and wherein the guide slit is designed to satisfy the following equation: t≧5a where t represents the thickness of the guide slit, a represents an interval between the mask and the base film, and 0<a≦50 mm.
地址 Seoul KR