发明名称 Array substrate and liquid crystal display
摘要 An array substrate, comprising a substrate and a data line and a gate line formed on the substrate. The data line and gate line cross each other to define a pixel region and the pixel region comprises a reflective region and a transparent region. The pixel region further comprises: a pixel electrode, formed with a transparent conductive film on the substrate and provided at least in the transparent region; a thin film transistor, formed on the substrate, the transparent conductive film being retained below the gate line and a gate electrode of the thin film transistor; a planarization film, covering the thin film transistor on the substrate; and a reflective layer, formed on the planarization film and disposed in the reflective region of the pixel region. A method of manufacturing the array substrate is provided.
申请公布号 US9070848(B2) 申请公布日期 2015.06.30
申请号 US201314017692 申请日期 2013.09.04
申请人 BEIJING BOE OPTOELECTRONICS TECHNOLOGY CO., LTD. 发明人 Gao Xuesong
分类号 G02F1/1335;H01L33/60;H01L27/12;G02F1/1362 主分类号 G02F1/1335
代理机构 Ladas & Parry LLP 代理人 Ladas & Parry LLP
主权项 1. An array substrate, comprising a substrate, and a data line and a gate line that are formed on the substrate, wherein the data line and gate line cross each other to define a pixel region and the pixel region comprises a reflective region and a transparent region, and wherein the pixel region further comprises: a pixel electrode, formed with a transparent conductive film on the substrate and provided at least in the transparent region;a thin film transistor including a gate electrode, a drain electrode and a source electrode, the thin film transistor being formed on the substrate, the transparent conductive film being retained below the gate line and the gate electrode of the thin film transistor;a planarization film, covering the thin film transistor on the substrate, and having an entirely flat surface; anda reflective layer, directly formed on the planarization film and disposed in the reflective region of the pixel region,wherein the pixel region further comprises a reflective structure, and the reflective structure is formed below the reflective layer through the planarization film.
地址 Beijing CN