发明名称 |
Array substrate and liquid crystal display |
摘要 |
An array substrate, comprising a substrate and a data line and a gate line formed on the substrate. The data line and gate line cross each other to define a pixel region and the pixel region comprises a reflective region and a transparent region. The pixel region further comprises: a pixel electrode, formed with a transparent conductive film on the substrate and provided at least in the transparent region; a thin film transistor, formed on the substrate, the transparent conductive film being retained below the gate line and a gate electrode of the thin film transistor; a planarization film, covering the thin film transistor on the substrate; and a reflective layer, formed on the planarization film and disposed in the reflective region of the pixel region. A method of manufacturing the array substrate is provided. |
申请公布号 |
US9070848(B2) |
申请公布日期 |
2015.06.30 |
申请号 |
US201314017692 |
申请日期 |
2013.09.04 |
申请人 |
BEIJING BOE OPTOELECTRONICS TECHNOLOGY CO., LTD. |
发明人 |
Gao Xuesong |
分类号 |
G02F1/1335;H01L33/60;H01L27/12;G02F1/1362 |
主分类号 |
G02F1/1335 |
代理机构 |
Ladas & Parry LLP |
代理人 |
Ladas & Parry LLP |
主权项 |
1. An array substrate, comprising
a substrate, and a data line and a gate line that are formed on the substrate, wherein the data line and gate line cross each other to define a pixel region and the pixel region comprises a reflective region and a transparent region, and wherein the pixel region further comprises:
a pixel electrode, formed with a transparent conductive film on the substrate and provided at least in the transparent region;a thin film transistor including a gate electrode, a drain electrode and a source electrode, the thin film transistor being formed on the substrate, the transparent conductive film being retained below the gate line and the gate electrode of the thin film transistor;a planarization film, covering the thin film transistor on the substrate, and having an entirely flat surface; anda reflective layer, directly formed on the planarization film and disposed in the reflective region of the pixel region,wherein the pixel region further comprises a reflective structure, and the reflective structure is formed below the reflective layer through the planarization film. |
地址 |
Beijing CN |