发明名称 |
Solid-state imaging device, method of driving the same, and electronic system including the device |
摘要 |
A solid-state imaging device includes: a unit pixel including a photoelectric conversion section, an impurity-diffusion region capable of temporarily accumulating or holding electric charges generated by the photoelectric conversion section, and a reset transistor resetting the impurity-diffusion region by a voltage of a voltage-supply line, and having an impurity concentration such that at least the reset transistor side of the impurity-diffusion region becomes a depletion state; and a drive circuit changing the voltage of the voltage-supply line from a first voltage lower than a depletion potential of the reset transistor side of the impurity-diffusion region to a second voltage higher than the depletion potential while the reset transistor is on. |
申请公布号 |
US9071780(B2) |
申请公布日期 |
2015.06.30 |
申请号 |
US201414471035 |
申请日期 |
2014.08.28 |
申请人 |
SONY CORPORATION |
发明人 |
Oike Yusuke |
分类号 |
H04N5/335;H04N5/355;H01L27/146;H04N5/359;H04N5/363;H04N5/374 |
主分类号 |
H04N5/335 |
代理机构 |
Dentons US LLP |
代理人 |
Dentons US LLP |
主权项 |
1. A solid-state imaging device comprising:
a unit pixel including (a) a photoelectric conversion section, (b) a floating diffusion section including (i) an impurity-diffusion region in a well of a first conductivity type and capable of temporarily accumulating or holding electric charges generated by the photoelectric conversion section and (ii) a sub-region at least partially in the impurity-diffusion region, and (c) a reset transistor that resets the impurity-diffusion region by using a voltage of a voltage-supply line, the sub-region having an impurity concentration such that at least a part of the impurity-diffusion region is enabled to achieve a depletion state; wherein,
the sub-region is located at a side of the impurity-diffusion region that is closest to the reset transistor,a surface of the floating diffusion section that is exposed from the well includes a surface of the impurity-diffusion region and a surface of the sub-region,the impurity-diffusion region and the sub-region are of a second conductivity type opposite the first conductivity type, andthe impurity concentration of the sub-region is less than that of the impurity-diffusion region. |
地址 |
Tokyo JP |