发明名称 Epitaxial lift off stack having a pre-curved handle and methods thereof
摘要 Embodiments of the invention generally relate to epitaxial lift off (ELO) thin films and devices and methods used to form such films and devices. In one embodiment, a method for forming an ELO thin film is provided which includes depositing an epitaxial material over a sacrificial layer on a substrate, adhering a flattened, pre-curved support handle onto the epitaxial material, and removing the sacrificial layer during an etching process. The etching process includes bending the pre-curved support handle to have substantial curvature while peeling the epitaxial material from the substrate and forming an etch crevice therebetween. Compression is maintained within the epitaxial material during the etching process. The flattened, pre-curved support handle may be formed by flattening a pre-curved support material.
申请公布号 US9070764(B2) 申请公布日期 2015.06.30
申请号 US200912475406 申请日期 2009.05.29
申请人 Alta Devices, Inc. 发明人 Archer Melissa;Atwater Harry;Gmitter Thomas;He Gang;Hegedus Andreas;Higashi Gregg;Sonnenfeldt Stewart
分类号 H01L21/78;H01L21/683 主分类号 H01L21/78
代理机构 代理人
主权项 1. A thin film stack material for at least one device selected from a group consisting of a solar device, a semiconductor device, and an electronic device, said thin film stack material comprising: a sacrificial layer disposed on a substrate; an epitaxial material disposed over the sacrificial layer; a pre-curved support material configured to be flattened; and a flattened, pre-curved support handle comprising the pre-curved support material disposed over the epitaxial material, wherein the flattened, pre-curved support handle is under tension while the epitaxial material is under compression, and wherein said flattened, pre-curved support handle is operable to bend said epitaxial material responsive to an etching of said sacrificial layer.
地址 Santa Clara CA US