PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT USING SAME, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR PRODUCING TOUCH PANEL

摘要

The present invention relates to a positive-type photosensitive resin composition comprising: (A) a denatured phenol resin having an unsaturated hydrocarbon group; (B) a meta-para-cresol resin; (C) an ortho-cresol resin; (D) a compound for generating acid by light; and a silane compound having a frame of polybasic acid or a frame of a polybasic acid anhydride. A content of (E) is equivalent to or less than 10 parts by mass based on total 100 parts by mass of (A), (B), (C), and (D).