发明名称 Pinched plasma bridge flood gun for substrate charge neutralization
摘要 A plasma flood gun for an ion implantation system includes an insulating block portion and first and second conductive block portions disposed on opposite sides of the insulating block portion. Conductive straps can be coupled between the first and second conductive block portions. The conductive block portions and the central body portion include recesses which form a closed loop plasma chamber. A power source is coupled to the conductive block portions for inductively coupling radio frequency electrical power into the closed loop plasma chamber to excite the gaseous substance to generate a plasma. The respective recess in the second conductive block portion includes a pinch region having a cross-sectional dimension that is smaller than a cross-sectional area of portion of the closed loop plasma chamber directly adjacent the pinch region. The pinch region can be positioned immediately adjacent an outlet portion formed in the second conductive block portion.
申请公布号 US9070538(B2) 申请公布日期 2015.06.30
申请号 US201314137196 申请日期 2013.12.20
申请人 Varian Semiconductor Equipment Associates, Inc. 发明人 Shajii Ali;Sonnenshein David;Kishinevsky Michael;Cowe Andrew B.;Stratoti Gregory E.
分类号 H01J37/30;H01J37/02;H01L21/265;H01J37/32;H01L21/67 主分类号 H01J37/30
代理机构 代理人
主权项 1. A plasma flood gun for use in ion implantation system, the plasma flood gun comprising: an insulating block portion having a base portion and a central body portion; first and second conductive block portions disposed on the base portion and opposite sides of the central body portion; and a conductive strap coupling the first conductive block portion to the second conductive block portion; the first and second conductive block portions and the central body portion including respective recesses formed therein which form a closed loop plasma chamber, wherein the first and second conductive block portions receive radio frequency (RF) electrical power to generate a plasma within the closed loop plasma chamber by exciting a gaseous substance; and wherein the respective recess in the second conductive block portion includes a pinch region having a cross-sectional dimension that is smaller than a cross-sectional dimension of a portion of the closed loop plasma chamber directly adjacent the pinch region, the pinch region positioned immediately adjacent an outlet portion having an outlet aperture.
地址 Gloucester MA US
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