发明名称 Lithographic printing plate precursor and method of preparing lithographic printing plate
摘要 A lithographic printing plate precursor includes a support and one or more layers, one of the one or more layers is a photosensitive layer containing an initiator compound, a polymerizable compound and a binder polymer, and a layer being in contact with the support of the one or more layers contains a copolymer containing a repeating unit having a zwitterionic structure and a repeating unit having a structure capable of interacting with a surface of the support.
申请公布号 US9067400(B2) 申请公布日期 2015.06.30
申请号 US201314024010 申请日期 2013.09.11
申请人 FUJIFILM Corporation 发明人 Iwai Yu;Abe Junya;Ishiguro Yuriko;Oohashi Hidekazu
分类号 G03F7/00;G03F7/26;B41C1/10;G03F7/09;G03F7/11 主分类号 G03F7/00
代理机构 Sughrue Mion, PLLC 代理人 Sughrue Mion, PLLC
主权项 1. A lithographic printing plate precursor comprising a support and one or more layers, wherein one of the one or more layers is a photosensitive layer comprising an initiator compound, a polymerizable compound and a binder polymer, and a layer being in contact with the support of the one or more layers comprises a copolymer containing a repeating unit having a zwitterionic structure and a repeating unit having a structure capable of interacting with a surface of the support, wherein the zwitterionic structure is a structure represented by the following formula (i) or (ii): wherein R1 and R2 each independently represents a hydrogen atom or a substituent having from 1 to 30 carbon atoms, L1 and L2 each independently represents an organic connecting group, A represents a carboxylate or a sulfonate, B represents a substituent having a positive charge, and * represents a site connecting to a main chain or side chain of the copolymer; wherein the structure capable of interacting with a surface of the support is a carboxylic acid structure, a carboxylate structure, a sulfonic acid structure, a sulfonate structure, a phosphonic acid structure, a phosphonate structure, a phosphoric acid ester structure or a phosphoric acid ester salt structure; and wherein the photosensitive layer is a layer different from the layer being in contact with the support.
地址 Tokyo JP