发明名称 |
PHOTOCURABLE ACRYLIC RESIN AND PHOTOCURABLE COMPOSITION COMPRISING THE SAME |
摘要 |
<p>The present invention provides a photocurable acrylic resin which is manufactured by an addition reaction of acid anhydride of carboxylic acid and sulfonic acid with an acrylic copolymer having a (meth)acrylate functional group and a hydroxyl functional group, and a photocurable composition with excellent developing properties comprising the same.</p> |
申请公布号 |
KR20150072837(A) |
申请公布日期 |
2015.06.30 |
申请号 |
KR20130160429 |
申请日期 |
2013.12.20 |
申请人 |
DONGWOO FINE-CHEM CO., LTD. |
发明人 |
CHOI, HAN YOUNG;LEE, HUN HEE;LEE, JONG SOO |
分类号 |
C08F20/10;C08F8/36;C08L33/04 |
主分类号 |
C08F20/10 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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