发明名称 PHOTOCURABLE ACRYLIC RESIN AND PHOTOCURABLE COMPOSITION COMPRISING THE SAME
摘要 <p>The present invention provides a photocurable acrylic resin which is manufactured by an addition reaction of acid anhydride of carboxylic acid and sulfonic acid with an acrylic copolymer having a (meth)acrylate functional group and a hydroxyl functional group, and a photocurable composition with excellent developing properties comprising the same.</p>
申请公布号 KR20150072837(A) 申请公布日期 2015.06.30
申请号 KR20130160429 申请日期 2013.12.20
申请人 DONGWOO FINE-CHEM CO., LTD. 发明人 CHOI, HAN YOUNG;LEE, HUN HEE;LEE, JONG SOO
分类号 C08F20/10;C08F8/36;C08L33/04 主分类号 C08F20/10
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