| 摘要 |
<p>A matching network device, coupled between an RF generator and a plasma processing device, comprises an impedance matching module, a control module and a detection module. The control module is coupled to the impedance matching module and has a default mode. The default mode according to the impedance range of the plasma processing device indicates matching impedance conversion of the impedance matching module. The detection module is coupled among the control module, the RF generator and the plasma processing device. When the detection module detects the impedance of the RF generator and the plasma processing device to output a detection signal to the control module, the control module adjusts the default mode based on the detection signal, so that the impedance matching module transmits an RF energy generating by the RF module to the plasma processing device.</p> |
