COMPOSITION FOR FORMING OVERLAY FILM, AND RESIST PATTERN FORMATION METHOD USING SAME

摘要

[Object] To provide a composition for forming a topcoat layer enabling to produce a pattern excellent in roughness and in pattern shape; and also to provide a pattern formation method employing that. [Means for solving] A composition for forming a topcoat layer, comprising a solvent and a fullerene derivative having a hydrophilic group; and also a method of forming a pattern by casting the above composition on a resist surface and then by subjecting it to exposure and development. [Selected drawing] None