PHYSICAL VAPOR DEPOSITION (PVD) TARGET HAVING LOW FRICTION PADS
摘要
<p>Embodiments of target assemblies for use in substrate processing chambers are provided herein. In some embodiments, a target assembly includes a plate comprising a first side including a central portion and a support portion; a target disposed on the central portion; a plurality of recesses formed in the support portion; and a plurality of pads partially disposed in the plurality of recesses.</p>
申请公布号
WO2015094515(A1)
申请公布日期
2015.06.25
申请号
WO2014US65023
申请日期
2014.11.11
申请人
APPLIED MATERIALS, INC.
发明人
RIKER, MARTIN LEE;PAI, UDAY;FRUCHTERMAN, WILLIAM;MILLER, KEITH A.;RASHEED, MUHAMMAD M.;NGUYEN, THANH X.;SAVANDAIAH, KIRANKUMAR