Multipurpose Combinatorial Vapor Phase Deposition Chamber

摘要

In some embodiments, apparatus are provided that provide for flexible processing in high productivity combinatorial (HPC) system. The apparatus allow for interchangeable functionality that includes deposition, plasma treatment, ion beam treatment, in-situ annealing, and in-situ metrology. The apparatus are designed so that the functionality may be integrated within a single processing chamber for enhanced flexibility.

主权项

1. A method comprising:
providing a process chamber, wherein the process chamber comprises a showerhead, and wherein the showerhead comprises a plurality of process segments; positioning a substrate beneath the showerhead; performing a first process on a first isolated region of the substrate through a first process segment; rotating the substrate to position the first isolated region beneath a second process segment; and performing a second process on the first isolated region of the substrate through the second process segment.