发明名称 METHOD FOR PROCESSING GRAPHENE, METHOD FOR PRODUCING GRAPHENE NANORIBBONS, AND GRAPHENE NANORIBBONS
摘要 A gas comprising H2O molecules is introduced into a cluster-generating unit through a nozzle of a gas cluster ion beam device. The introduced water vapor is aggregated by cooling by adiabatic expansion, and beam-shaped H2O clusters are formed. The H2O clusters, having been introduced into an irradiation unit, are ionized by an ionization device. The H2O clusters, having been ionized and positively charged, are drawn out by a plurality of electrodes to which a lower voltage than that of the ionization device is applied; after acceleration, focusing of the beams, and separation of cluster sizes by the electrodes, a substrate on which a sheet of graphene has been formed is irradiated to etch the graphene into nanoribbons having edges of an armchair shape.
申请公布号 US2015179451(A1) 申请公布日期 2015.06.25
申请号 US201314390402 申请日期 2013.03.27
申请人 TOKYO ELECTRON LIMITED 发明人 Matsumoto Takashi
分类号 H01L21/04 主分类号 H01L21/04
代理机构 代理人
主权项 1. A method for processing graphene, comprising: etching graphene by irradiating the graphene with an ion beam formed by ionizing water molecules or water molecule-agglomerated clusters by means of a gas cluster ion beam apparatus.
地址 Tokyo JP