发明名称 |
METHOD FOR PREPARING SAMPLES FOR IMAGING |
摘要 |
A method and apparatus is provided for preparing samples for observation in a charged particle beam system in a manner that reduces or prevents artifacts. Material is deposited onto the sample using charged particle beam deposition just before or during the final milling, which results in an artifact-free surface. Embodiments are useful for preparing cross sections for SEM observation of samples having layers of materials of different hardnesses. Embodiments are useful for preparation of thin TEM samples. |
申请公布号 |
US2015179402(A1) |
申请公布日期 |
2015.06.25 |
申请号 |
US201414572626 |
申请日期 |
2014.12.16 |
申请人 |
FEI Company |
发明人 |
Kelley Ronald;Moriarty Michael;Stone Stacey;Blackwood Jeffrey |
分类号 |
H01J37/305;C23C14/30 |
主分类号 |
H01J37/305 |
代理机构 |
|
代理人 |
|
主权项 |
1. A method of preparing a sample for analysis, the method comprising:
directing an ion beam toward a work piece to remove material and expose a surface, the exposed surface having irregularities; depositing material on the exposed surface, the deposited material smoothing the irregularities; directing an ion beam toward the work piece to remove the deposited materials and some material from the exposed surface to produce a smooth cross sectional face. |
地址 |
Hillsboro OR US |