WAVEFRONT ANALYSIS INSPECTION APPARATUS AND METHOD

摘要

The present invention provides high-resolution wavefront measurement systems and methods for real-time inspection of optical and geometrical properties of specular and transparent objects, the systems of the invention comprising at least one illumination apparatus, at least one imaging apparatus constructed and configured to image the object onto an image plane, at least one gradient element disposed at one of the aperture stops of the imaging apparatus; and a sensor placed in the image plane of the imaging apparatus, wherein the sensor is capable of differentiating between different areas of the gradient element thereby being adapted to provide real-time optical and geometrical data of the object.

主权项

1. An optical system configured for viewing an object, said optical system comprising:
an illumination system configured to illuminate said object; an imaging system configured to image said object onto a sensor, said imaging system comprising at least one optical surface; a physical aperture stop of said imaging system, said physical aperture stop being disposed in the imaging system within an aperture stop plane; and a light source of said illumination system, placed in said aperture stop plane, configured such that light travels in a first direction from said light source to said object via said at least one optical surface, and wherein, after having reached said object, said light goes back in a second reverse direction, in a reverse order, towards said physical aperture stop via said at least one optical surface, and reaches said sensor.