发明名称 METHOD FOR PROCESSING DEVICE WAFER
摘要 PROBLEM TO BE SOLVED: To allow a dicing device to be downsized.SOLUTION: A groove forming step forms a groove having a predetermined depth on a surface of a device wafer. A plate sticking step sticks a plate 20 to the surface of the device wafer via an adhesive 31. A grinding step holds the device wafer on a holding table via the plate 20 and forms a plurality of chips 15a to 15c by exposing the groove on the rear surface of the device wafer by grinding the rear surface of the exposed device wafer and dividing the device wafer. A film sticking step sticks a film to the rear surface of the device wafer. A dicing step divides the film from the rear surface 102 side along a division schedule line 13. A pickup step picks up chips 15a to 15c from the plate 20. The plate 20 has almost the same size as the device wafer 10, so upsizing of a dicing device can be suppressed even when the diameter of the device wafer 10 becomes larger.
申请公布号 JP2015119085(A) 申请公布日期 2015.06.25
申请号 JP20130262437 申请日期 2013.12.19
申请人 DISCO ABRASIVE SYST LTD 发明人 MIZOMOTO YASUTAKA
分类号 H01L21/301 主分类号 H01L21/301
代理机构 代理人
主权项
地址