发明名称 SUBSTRATE PROCESSING METHOD
摘要 A hydrophobizing agent vapor is supplied to a substrate and a surface of the substrate including a pattern is hydrophobized. Thereafter, the substrate is dried by vaporizing the hydrophobizing agent. The substrate to be processed is maintained in a state of not contacting water until it is dried after being hydrophobized. Collapse of a pattern formed on the substrate surface is thereby suppressed or prevented.
申请公布号 US2015179431(A1) 申请公布日期 2015.06.25
申请号 US201514639423 申请日期 2015.03.05
申请人 SCREEN Holdings Co., Ltd. 发明人 KIMURA Masahiro;KOJIMARU Tomonori;EMOTO Tetsuya;OKUTANI Manabu;OTSUJI Masayuki
分类号 H01L21/02;H01L21/67;F26B1/00;B08B3/08 主分类号 H01L21/02
代理机构 代理人
主权项 1. A substrate processing method comprising: a hydrophobizing step of hydrophobizing a surface of a substrate by supplying a vapor of a hydrophobizing agent to the substrate including a pattern formed on the surface of the substrate; a drying step of drying the substrate by vaporizing the hydrophobizing agent adhering to the substrate, after performing the hydrophobizing step; and a step of maintaining the substrate in a state of not contacting water from an end of the hydrophobizing step to an end of the drying step.
地址 Kyoto JP