发明名称 |
SUBSTRATE PROCESSING METHOD |
摘要 |
A hydrophobizing agent vapor is supplied to a substrate and a surface of the substrate including a pattern is hydrophobized. Thereafter, the substrate is dried by vaporizing the hydrophobizing agent. The substrate to be processed is maintained in a state of not contacting water until it is dried after being hydrophobized. Collapse of a pattern formed on the substrate surface is thereby suppressed or prevented. |
申请公布号 |
US2015179431(A1) |
申请公布日期 |
2015.06.25 |
申请号 |
US201514639423 |
申请日期 |
2015.03.05 |
申请人 |
SCREEN Holdings Co., Ltd. |
发明人 |
KIMURA Masahiro;KOJIMARU Tomonori;EMOTO Tetsuya;OKUTANI Manabu;OTSUJI Masayuki |
分类号 |
H01L21/02;H01L21/67;F26B1/00;B08B3/08 |
主分类号 |
H01L21/02 |
代理机构 |
|
代理人 |
|
主权项 |
1. A substrate processing method comprising:
a hydrophobizing step of hydrophobizing a surface of a substrate by supplying a vapor of a hydrophobizing agent to the substrate including a pattern formed on the surface of the substrate; a drying step of drying the substrate by vaporizing the hydrophobizing agent adhering to the substrate, after performing the hydrophobizing step; and a step of maintaining the substrate in a state of not contacting water from an end of the hydrophobizing step to an end of the drying step. |
地址 |
Kyoto JP |