| 摘要 |
The invention relates to a block copolymer film nanostructured in nanodomains at a predetermined temperature, obtained from a basic block copolymer which is nonstructured at said predetermined temperature, and at least one block of which comprises styrene and at least another block of which comprises methyl methacrylate. This block copolymer film is characterized in that it has the following modified chemical formula: (Aα(i)-co-Cy)n-b-(Bβ(k)-co-Dδ)n-1-b-(Aα(i+1)-co-Eε)n-2-b-(Bβ(k+1)-co-Fζ)n-3-b-...-b-(Bβ(k+x)-co-Wω)n-p in which: "n" represents the number of blocks of the block copolymer, "A" represents the styrene and "B" represents the methyl methacrylate, or vice versa, "C", "D", "E", "F", …, "W" represent respectively a comonomer, or a mixture of comonomers, introduced into each of the blocks of the block copolymer, the comonomer, or mixture of comonomers, introduced into a block based on styrene being different than the comonomer, or mixture of comonomers, introduced into a block based on methyl methacrylate, the indices αi and βk represent the numbers of units of styrene or methyl methacrylate monomers present in each block of the block copolymer, and are all independent of one another, the indices γ, δ, ε, ζ..., and ω represent the numbers of units of comonomers in a given block, and are all independent of one another, the indices αi, βk, γ, δ, ε, ζ and ω all being greater than or equal to 1. |
