| 摘要 |
PROBLEM TO BE SOLVED: To provide a structure preventing the occurrence of process unevenness when performing removal processing of a smear of a product to be processed in an ashing device, and an ashing method, including: a processing chamber for internally disposing the product to be processed; a lamp chamber having an accommodated ultraviolet lamp, for irradiating the product to be processed with an ultraviolet ray, and an ultraviolet transmission window member for sectioning from the processing chamber; and process gas supply means for supplying process gas to a processing space formed between the product to be processed and the window member.SOLUTION: Process gas supply means includes a control unit which can supply process gas with an appropriate flow rate to perform processing and process gas with a large flow rate excessive of the appropriate flow rate. The process gas with the large flow rate is supplied in an intermittent manner, and an exhaust gas (carbon dioxide gas) generated in the processing space is cleared away at constant time intervals, so that the exhaust gas is replaced by the process gas. |
