发明名称 ELECTRON BEAM DRAWING APPARATUS, ELECTRON BEAM DRAWING METHOD, AND STORAGE MEDIUM
摘要 An electron beam drawing apparatus includes: an accepting unit that accepts input graphic information, which is information representing at least one graphic; a graphic width acquiring unit that acquires a width of each of the at least one graphic represented by the input graphic information; a generating unit that generates approximate graphic information representing at least one approximate graphic, which is a graphic configured by at least one rectangle matching the width of the graphic, and is a graphic that approximates each of the at least one graphic represented by the input graphic information; and a drawing unit that draws the at least one approximate graphic represented by the approximate graphic information generated by the generating unit.
申请公布号 US2015178439(A1) 申请公布日期 2015.06.25
申请号 US201314406641 申请日期 2013.12.06
申请人 NIPPON CONTROL SYSTEM CORPORATION 发明人 Tao Takuya;Hamaji Masakazu
分类号 G06F17/50;H01J37/317;G03F1/78 主分类号 G06F17/50
代理机构 代理人
主权项 1. An electron beam drawing apparatus, comprising: an accepting unit that accepts input graphic information, which is information representing at least one graphic; a graphic width acquiring unit that acquires a width of each of the at least one graphic represented by the input graphic information; a generating unit that generates approximate graphic information representing at least one approximate graphic, which is a graphic configured by at least one rectangle matching the width of the graphic, and is a graphic that approximates each of the at least one graphic represented by the input graphic information; and a drawing unit that draws the at least one approximate graphic represented by the approximate graphic information generated by the generating unit.
地址 Tokyo JP