发明名称 NONVOLATILE MEMORY DEVICE AND METHOD OF FORMING THE SAME
摘要 <p>Disclosed is a nonvolatile memory device. The nonvolatile memory device includes selection gates on a semiconductor substrate, and cell gates provided on the semiconductor substrate between the selection gates. Each of the cell gates includes a floating gate pattern provided by interposing a tunnel insulating layer on the semiconductor substrate, a blocking insulating pattern on the floating gate pattern, and a control gate pattern on the blocking insulating pattern. The control gate includes a first control gate pattern, a second control gate pattern on the first control gate pattern, a cell metal pattern on the second control gate pattern, and an oxide layer between the first control gate pattern and the second control gate pattern.</p>
申请公布号 KR20150070490(A) 申请公布日期 2015.06.25
申请号 KR20130156522 申请日期 2013.12.16
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 HAN, JEE HOON;KIM, YOON HEE;PARK, JI SUN;SHIN, WANG CHUL
分类号 H01L27/115 主分类号 H01L27/115
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