发明名称 Reverse Blocking Transistor Device
摘要 A transistor device includes at least one transistor cell. The cell includes a drift region, a source region, a body region arranged between the source region and the drift region, and a drain region. The drift region is arranged between the body region and the drain region. A gate electrode is adjacent the body region and dielectrically insulated from the body region by a gate dielectric. A channel region of a doping type complementary to a doping type of the drain region is arranged between the drift region and the drain region. A drift control region is adjacent the drift region and dielectrically insulated from the drift region and the channel region by a drift control region dielectric. A first switch is coupled between the drift control region and the drain region.
申请公布号 US2015179633(A1) 申请公布日期 2015.06.25
申请号 US201314138244 申请日期 2013.12.23
申请人 Infineon Technologies Austria AG 发明人 Mauder Anton;Hirler Franz
分类号 H01L27/06;H03K17/687;H01L29/10;H01L29/78 主分类号 H01L27/06
代理机构 代理人
主权项 1. A transistor device comprising at least one transistor cell, the at least one transistor cell comprising: a drift region, a source region, a body region arranged between the source region and the drift region, and a drain region, wherein the drift region is arranged between the body region and the drain region; a gate electrode adjacent the body region and dielectrically insulated from the body region by a gate dielectric; a channel region of a doping type complementary to a doping type of the drain region that is arranged between the drift region and the drain region; a drift control region adjacent the drift region and dielectrically insulated from the drift region and the channel region by a drift control region dielectric; and a first switch coupled between the drift control region and the drain region.
地址 Villach AT