发明名称 |
Reverse Blocking Transistor Device |
摘要 |
A transistor device includes at least one transistor cell. The cell includes a drift region, a source region, a body region arranged between the source region and the drift region, and a drain region. The drift region is arranged between the body region and the drain region. A gate electrode is adjacent the body region and dielectrically insulated from the body region by a gate dielectric. A channel region of a doping type complementary to a doping type of the drain region is arranged between the drift region and the drain region. A drift control region is adjacent the drift region and dielectrically insulated from the drift region and the channel region by a drift control region dielectric. A first switch is coupled between the drift control region and the drain region. |
申请公布号 |
US2015179633(A1) |
申请公布日期 |
2015.06.25 |
申请号 |
US201314138244 |
申请日期 |
2013.12.23 |
申请人 |
Infineon Technologies Austria AG |
发明人 |
Mauder Anton;Hirler Franz |
分类号 |
H01L27/06;H03K17/687;H01L29/10;H01L29/78 |
主分类号 |
H01L27/06 |
代理机构 |
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代理人 |
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主权项 |
1. A transistor device comprising at least one transistor cell, the at least one transistor cell comprising:
a drift region, a source region, a body region arranged between the source region and the drift region, and a drain region, wherein the drift region is arranged between the body region and the drain region; a gate electrode adjacent the body region and dielectrically insulated from the body region by a gate dielectric; a channel region of a doping type complementary to a doping type of the drain region that is arranged between the drift region and the drain region; a drift control region adjacent the drift region and dielectrically insulated from the drift region and the channel region by a drift control region dielectric; and a first switch coupled between the drift control region and the drain region. |
地址 |
Villach AT |