EUV LITHOGRAPHY SYSTEM AND TRANSPORT DEVICE FOR TRANSPORTING A REFLECTIVE OPTICAL ELEMENT

摘要

The invention relates to an EUV lithography system (1) comprising: at least one gas nozzle (18) with a nozzle opening for the emergence of a gas stream (19) for removing contaminating substances from a surface (8a-14a) of the EUV lithography system (1) and/or for deflecting contaminating substances, with the gas stream (19) forming at least one gas vortex in the EUV lithography system (1). The invention also relates to a transport device for transporting a reflective optical element for EUV lithography, comprising: a receptacle element for receiving the optical element, a movement device for moving the receptacle element and an outflow device for generating gas curtains flowing along the surface on both sides of the optical element.