发明名称 MONOMER INCLUDING CARBAMOYL GROUP AND LACTONE SKELETON, POLYMERIC COMPOUND, AND PHOTORESIST COMPOSITION
摘要 PROBLEM TO BE SOLVED: To provide a monomer including a lactone skeleton, which shows excellent solubility with an organic solvent while holding stability such as chemical resistance when applied to a resist resin or the like, and which has high affinity to water and high solubility with water after hydrolysis, and a polymer comprising the monomer.SOLUTION: The monomer includes a carbamoyl group and a lactone skeleton represented by formula (1). In formula (1), Rrepresents H, an alkyl group having 1 to 6 carbon atoms, or the like; Rrepresents a halogen atom, an alkyl group having 1 to 6 carbon atoms which may have a halogen atom, or the like; A represents an alkylene group having 1 to 6 carbon atoms, O, S, or no bonding; m represents an integer of 0 to 8; X represents a specific carbamoyl group; n represents an integer of 1 to 9; Y represents a divalent organic group having 1 to 6 carbon atoms; and k represents 0 or 1.
申请公布号 JP2015117288(A) 申请公布日期 2015.06.25
申请号 JP20130260685 申请日期 2013.12.17
申请人 DAICEL CORP 发明人 KOYAMA YUTAKA;ONO MITSURU;NISHIMURA MASAMICHI
分类号 C08F20/18;G03F7/039 主分类号 C08F20/18
代理机构 代理人
主权项
地址