ELECTRON GUN DEVICE AND VACUUM DEPOSITION DEVICE

摘要

Provided are an electron gun device and a vacuum deposition device that are capable of generating a plurality of electron beams and that make it possible to simplify equipment. The electron gun device is provided with: a first filament; a second filament; a power source unit; a switching unit; and a control unit. The first and second filaments are capable of generating first and second electron beams. The power supply unit comprises a heating current supply unit that supplies a heating current for causing the first filament or the second filament to generate an electron beam and a bias supply unit that applies a bias to the heating current. The switching unit is configured so that it is possible to selectively switch between a first state in which drive current that results from applying bias voltage to the heating current is supplied to the first filament and a second state in which the drive current is supplied to the second filament. The control unit controls switching between the first state and the second state.