发明名称 Testing of Semiconductor Components and Circuit Layouts Therefor
摘要 In one embodiment of the present invention, a method of forming a semiconductor device includes performing a test during the forming of the semiconductor device within and/or over a substrate. A first voltage is applied to a first node coupled to a component to be tested in the substrate and a test voltage at a pad coupled to the component to be tested through a second node. The test voltage has a peak voltage higher than the first voltage. The component to be tested is coupled between the first node and the second node. A leakage current is measured through the component to be tested in response to the test voltage. After performing the test, the second node is connected to a functional block in the substrate. The first node is coupled to a third node coupled to the functional block.
申请公布号 US2015179534(A1) 申请公布日期 2015.06.25
申请号 US201314139687 申请日期 2013.12.23
申请人 Infineon Technologies AG 发明人 Roehner Michael;Aresu Stefano;Zannoth Markus
分类号 H01L21/66 主分类号 H01L21/66
代理机构 代理人
主权项 1. A method of forming a semiconductor device, the method comprising: performing a test during the forming of the semiconductor device within and/or over a substrate, the test comprising: applying a first voltage to a first node coupled to a component to be tested in the substrate and a test voltage at a pad coupled to the component to be tested through a second node, wherein the test voltage has a peak voltage higher than the first voltage, wherein the component to be tested is coupled between the first node and the second node, andmeasuring a leakage current through the component to be tested in response to the test voltage; and after performing the test, connecting the second node to a functional block in the substrate, wherein the first node is coupled to a third node coupled to the functional block.
地址 Neubiberg DE