A-SI SEASONING EFFECT TO IMPROVE SIN RUN-TO-RUN UNIFORMITY

摘要

Embodiments of the present invention provide methods for depositing a nitrogen-containing material on large-sized substrates disposed in a processing chamber. In one embodiment, a method includes processing a batch of substrates within a processing chamber to deposit a nitrogen-containing material on a substrate from the batch of substrates, and performing a seasoning process at predetermined intervals during processing the batch of substrates to deposit a conductive seasoning layer over a surface of a chamber component disposed in the processing chamber. The chamber component may include a gas distribution plate fabricated from a bare aluminum without anodizing. In one example, the conductive seasoning layer may include amorphous silicon, doped amorphous silicon, doped silicon, doped polysilicon, doped silicon carbide, or the like.

主权项

1. A method for processing a substrate, comprising:
performing a first chamber seasoning process to deposit a first seasoning layer over a surface of a chamber component disposed in a processing chamber without any substrate being present; performing a deposition process to deposit a material layer on a first batch of substrates within the processing chamber; after the last substrate of the first batch of substrates is deposited with the material layer, performing a second chamber seasoning process to deposit a conductive seasoning layer over the surface of the chamber component disposed in the processing chamber without any substrate being present; and after the second chamber seasoning process, performing the deposition process to deposit a material layer on a second batch of substrates within the processing chamber.