| 摘要 |
A coating machine nozzle cleaning apparatus comprises a cleaning device (200), a photoresist removal solvent supplying apparatus (300) and a liquid discharge apparatus (500). The cleaning device (200) is provided with a groove (210) matching a nozzle (100). A photoresist removal solvent supplying hole (202) is arranged on a side wall of the groove (210). The photoresist removal solvent supplying apparatus (300) is connected to the photoresist removal solvent supplying hole (202) to supply photoresist removal solvent to the groove (210). A liquid discharge hole (206) is arranged on a bottom wall of the groove (210). The liquid discharge apparatus (500) is connected to the liquid discharge hole (206). Photoresist remaining on the nozzle is dissolved in the photoresist removal solvent, and is discharged through the liquid discharge hole, making the photoresist remaining on the nozzle be removed smoothly. |
