| 摘要 |
PROBLEM TO BE SOLVED: To provide an electrode plate for a plasma processing apparatus which allows for in-plane uniform plasma treatment of a processed substrate, and to provide a manufacturing method therefor. ! SOLUTION: A method of manufacturing an electrode plate for a plasma processing apparatus has: a vent processing step for forming a plurality of vents 31 penetrating an electrode plate 3 in the thickness direction by drilling; a cleaning step for cleaning in the vents 31; and an etching step for etching the electrode plate 3 following to the cleaning step. The cleaning step is performed by fixing a box 210 in a state where the opening end is brought into tight contact with a peripheral edge 3a of one surface of the electrode plate 3, supplying a cleaning liquid F, in pressurized state, to a space 210a surrounded by the box 210 and the electrode plate 3, and allowing the cleaning liquid F to flow through the vents 31 from one surface (back surface 3b) to the other surface (front surface 3c). ! COPY |
