| 摘要 |
A main cell and a sense cell are formed in a first and second region of a semiconductor substrate respectively. A base layer is formed on a drift layer in the first and second regions. A first conductivity type impurity is implanted in the base layer by using a mask having first and second openings respectively on the first and second regions in order to form first and second emitter regions on the base layer respectively in the first and second regions. First and second contact regions, first and second trench gates, and a collector layer are formed. An area of the second opening is smaller than an area of the first opening. Threshold voltage of the sense cell is higher than threshold voltage of the main cell. |
