| 发明名称 |
Substrate Processing Apparatus |
| 摘要 |
There is provided a substrate processing apparatus including: a chamber providing an internal space, in which a substrate is transferred through a passage and a process is performed on the substrate, and having a supply port supplying a gas to the substrate; and a susceptor installed in the internal space and including a heating region heating the substrate and a pre-heating region pre-heating the gas supplied from the supply port. |
| 申请公布号 |
US2015176128(A1) |
申请公布日期 |
2015.06.25 |
| 申请号 |
US201414573644 |
申请日期 |
2014.12.17 |
| 申请人 |
Eugene Technology Co., Ltd. |
发明人 |
Song Byoung-Gyu;Kim Kyong-Hun;Kim Yong-Ki;Shin Yang-Sik;Kim Chang-Dol;Shin Chang-Hun;Kim Eun-Duck |
| 分类号 |
C23C16/46;C23C16/455;C23C16/458 |
主分类号 |
C23C16/46 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A substrate processing apparatus, comprising:
a chamber providing an internal space, in which a substrate is transferred through a passage and a process is performed on the substrate, and having a supply port supplying a gas to the substrate; and a susceptor installed in the internal space and including a heating region heating the substrate and a pre-heating region pre-heating the gas supplied from the supply port. |
| 地址 |
Yongin-si KR |
