Method and Apparatus for Electron Beam Lithography

摘要

A system using an energy beam to expose patterns on a wafer includes first mirror elements, a multiplexer element, and second mirror elements. The first and second mirror elements are dynamically controlled to reflect the energy beam to the wafer. The first mirror elements are configured in a first chain having a first data input and a first data output. The multiplexer element includes a second data input, a third data input, a select input, and a second data output. The third data input is coupled to the first data output. The second mirror elements are configured in a second chain having a fourth data input.

主权项

1. A system using an energy beam to expose patterns on a wafer, comprising:
a first plurality of mirror elements; and a second plurality of mirror elements; wherein: the first plurality of mirror elements is configured to expose the wafer using the energy beam; and the second plurality of mirror elements is configured to substitute the first plurality when at least one mirror element of the first plurality is found defective.