<p>A gate electrode is formed on a substrate. An active layer is formed on the gate electrode. A metal layer is formed on the active layer. An amorphous carbon layer is formed on the metal layer. A mask pattern is formed on the amorphous carbon layer. An amorphous carbon pattern is formed by patterning the amorphous carbon layer by using a mask pattern. The metal layer and the active layer are patterned by using the mask pattern and the amorphous carbon pattern so a metal pattern and an active pattern are formed. A source electrode and a drain electrode are formed by etching the metal pattern corresponding to the position of a channel region of the active pattern. The amorphous carbon pattern is removed. A display substrate is formed by forming a pixel which is electrically connected to a thin film transistor where the gate electrode, the active pattern, the source electrode, and the drain electrode are defined. An opposite substrate combined to the display substrate is formed.</p>
申请公布号
KR20150070839(A)
申请公布日期
2015.06.25
申请号
KR20130157494
申请日期
2013.12.17
申请人
SAMSUNG DISPLAY CO., LTD.
发明人
CHUN, JUN;KIM, JI HYUN;PARK, SUNG KYUN;PARK, JEONG MIN;LEE, JUNG SOO;CHO, KI HYUN