| 发明名称 |
PHOTORESIST PHOTOSENSITIVE RESIN COMPOSITION AND (METH)ACRYLIC COPOLYMER USED FOR THE SAME |
| 摘要 |
PROBLEM TO BE SOLVED: To provide a novel resist photosensitive resin composition for producing a hydroxy group through a deprotection reaction.SOLUTION: A photoresist (meth)acrylic copolymer comprises the general formula (1) in a repeating unit. (In the formula, Rrepresents a hydrogen atom or methyl group, and Rrepresents a C2-5 linear or branched alkyl group.) |
| 申请公布号 |
JP2015117305(A) |
申请公布日期 |
2015.06.25 |
| 申请号 |
JP20130261288 |
申请日期 |
2013.12.18 |
| 申请人 |
MITSUBISHI GAS CHEMICAL CO INC |
发明人 |
HAYAKAWA SHOICHI;TANAKA HIROYASU;TANAKI HIROYUKI;FURUKAWA KIKUO;HORIKOSHI HIROSHI |
| 分类号 |
C08F220/28;G03F7/039;H01L21/027 |
主分类号 |
C08F220/28 |
| 代理机构 |
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