Patterning by Area Selective Oxidation

摘要

Technologies are described for methods for producing a pattern of a material on a substrate. The methods may comprise receiving a patterned block copolymer on a substrate. The patterned block copolymer may include a first polymer block domain and a second polymer block domain. The method may comprise exposing the patterned block copolymer to a light effective to oxidize the first polymer block domain in the patterned block copolymer. The method may comprise applying a precursor to the block copolymer. The precursor may infuse into the oxidized first polymer block domain and generate the material. The method may comprise applying a removal agent to the block copolymer. The removal agent may be effective to remove the first polymer block domain and the second polymer block domain from the substrate, and may not be effective to remove the material in the oxidized first polymer block domain.

主权项

1. A method for producing a pattern of a material on a substrate, the method comprising:
receiving a sample, wherein the sample includes a patterned block copolymer on a substrate, and wherein the patterned block copolymer includes a first polymer block domain and a second polymer block domain; exposing the patterned block copolymer on the substrate to a light to generate an oxidized block copolymer on the substrate, wherein the light is effective to oxidize the first polymer block domain in the patterned block copolymer and the light is not effective to oxidize the second polymer block domain in the patterned block copolymer; applying a precursor to the oxidized block copolymer on the substrate to generate a material on the substrate, wherein the precursor infuses into the oxidized first polymer block domain and generates the material in the first polymer block domain and the precursor does not infuse into the second polymer block domain; applying a removal agent to the oxidized block copolymer on the substrate to generate a patterned material on the substrate, wherein the removal agent is effective to remove the first polymer block domain and the second polymer block domain from the substrate, and is not effective to remove the material in the oxidized first polymer block domain.