| 摘要 |
The invention provides a photo-acid generator having high developing properties, a cationic polymerization initiator having high curing properties, and a resist composition and a cationically polymerizable composition containing the photo-acid generator and the cationic polymerization initiator, respectively. Specifically, the invention provides an aromatic sulfonium salt compound of general formula (I) and a photo-acid generator, a cationic polymerization initiator, a resist composition, and a cationically polymerizable composition containing the compound. In formula (I), R 1 to R 19 are each hydrogen, halogen, hydroxyl, optionally hydroxyl-substituted C1-C18 alkyl, optionally hydroxyl-substituted C1-C18 alkoxy, optionally hydroxyl-substituted C1-C18 thioalkoxy, etc.; An - is a monovalent anion; at least one of R 1 to R 19 is a substituent selected from the group consisting of hydroxyl, hydroxyl-substituted C1-C12 ester group, hydroxyl-substituted C1-C18 alkoxy, and hydroxyl-substituted C1-C18 thioalkoxy. |
