Device for accumulating a treatment liquid inside of a treatment area of a horizontal processing apparatus for a galvanic or wet-chemical metal deposition

摘要

The present invention is related to a device for accumulating a treatment liquid inside of a treatment area of a horizontal processing apparatus for a galvanic or wet-chemical metal deposition on a flat substrate to be treated, wherein the device comprises at least a liquid weir at the entry and/or at the exit of such a treatment area and a means of transport for transporting the flat substrates to be treated at a transport level through the horizontal processing apparatus, wherein the at least one liquid weir is arranged below the means of transport of the horizontal processing apparatus and below the transport level of the flat substrates to be treated; wherein the liquid weir is positioned in such a way that a gap between the upper surface of the liquid weir and the lower surface of the means of transport is adjustable and/or controllable. The invention is further related to a method for galvanic or wet-chemical metal depositing on a flat substrate to be treated using such a device; and to the use of such a device for treating a flat substrate to be treated.