| 摘要 |
PROBLEM TO BE SOLVED: To provide a polishing pad having improved dressing properties while hardness is maintained.SOLUTION: The polishing pad has a polishing layer formed of a polyurethane resin foam. The polyurethane resin foam contains, as starting material components, (A) an isocyanate component, (B) a polyol component, (C) an aromatic compound that has one hydroxyl group and/or an aromatic compound that has one amino group, and (D) hollow microspheres. |
