| 摘要 |
The present invention provides an imprint, apparatus which performs an imprint process of transferring a pattern onto a substrate, the apparatus comprising a deforming unit configured to deform the pattern surface by applying a force to the mold, an obtaining unit configured to obtain thickness information of the mold, a calculation unit configured to calculate a force to be applied to the mold based on the thickness information of the mold obtained by the obtaining unit, so that the pattern surface has a target, shape in the imprint process, and a control unit configured to control the deforming unit, to apply the force calculated by the calculation unit to the mold in the imprint process. |
