发明名称 ELECTRON MICROSCOPE PLASMA CLEANER
摘要 <p>The present invention relates to an electron microscope plasma cleaner, and more specifically, to an organic cleaner having a plasma generating electrode in a triplex structure for effectively generating the plasma and a multi gas injection nozzle. An apparatus for cleaning an electron microscope magnifying a reflection of a sample with the plasma using an electron beam related to an embodiment of the present invention comprises: a vacuum chamber for arranging the sample inside, and having the vacuous inside to use a flow of an electron; an electron gun for generating the electron beam, and outputting the generated electron beam in the sample; an electron lens for magnifying the electron beam penetrating through the sample, and projecting the electron beam on a fluorescent screen; an RF controller for producing a first signal having a radio frequency of a preset range; and a plasma head for producing the plasma, receiving the first signal from the RF controller, producing oxygen radical and ion activated with the plasma and the first signal, and supplying the activated plasma and the first signal inside the vacuum chamber. The present invention enables to remove contamination existing inside the vacuum chamber with the activated oxygen radical and the ion supplied inside the vacuum chamber.</p>
申请公布号 KR101530282(B1) 申请公布日期 2015.06.24
申请号 KR20140116933 申请日期 2014.09.03
申请人 HITACHI HIGH-TECHNOLOGIES KOREA CO., LTD. 发明人 HYUNG, HYUNG CHUL
分类号 H01J37/26;H01J9/38 主分类号 H01J37/26
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