发明名称 Method for repairing display device and apparatus for same
摘要 An object of the present invention is to provide a method for repairing a display device according to which a wide variety of regions can be repaired in various ways using various materials, as well as an apparatus for the same. The present invention provides a repairing apparatus for repairing a pattern defect on a surface of a substrate in a display device where an electronic circuit pattern having the above described pattern defect is formed, characterized by having a plasma irradiation means for repairing the above described pattern defect through local irradiation of a region including the above described pattern defect with plasma.
申请公布号 US9063356(B2) 申请公布日期 2015.06.23
申请号 US200912507826 申请日期 2009.07.23
申请人 JAPAN DISPLAY INC.;PANASONIC LIQUID CRYSTAL DISPLAY CO., LTD. 发明人 Arai Takeshi;Nakasu Nobuaki;Edamura Tadao;Oroku Noriyuki
分类号 C23C16/44;C23C16/00;C23C16/52;G02F1/13 主分类号 C23C16/44
代理机构 Lowe Hauptman & Ham, LLP 代理人 Lowe Hauptman & Ham, LLP
主权项 1. An apparatus for repairing a display device having a pattern defect on a surface of a substrate where an electronic circuit pattern having said pattern defect is formed, comprising: a first gas supplying portion for supplying a first gas; a tubule configured to have a plasma generated within the tubule from the first gas and for jetting the plasma toward the surface of the substrate from the tubule; a second gas supplying portion for supplying a second gas comprising a material gas for forming a thin film or an etching gas toward the surface of the substrate from an opening of the second gas supplying portion, wherein the second gas supplying portion is provided separately from and outside of the tubule; an observation mechanism including a camera which compares a normal pixel and a defective pixel, recognizes a location and a size of the defect of the pattern defect and categorizes the type of the defect; and a mask for making the plasma jet finely pointed, wherein said mask is provided between said tubule and the substrate, the second gas supplying portion is provided between said mask and the substrate, and a plurality of through holes of different dimensions are formed on the mask.
地址 Tokyo JP