发明名称 Memory including blocking dielectric in etch stop tier
摘要 Vertical memories and methods of making the same are discussed generally herein. In one embodiment, a vertical memory can include a vertical pillar extending to a source, an etch stop tier over the source, and a stack of alternating dielectric tiers and conductive tiers over the etch stop tier. The etch stop tier can comprise a blocking dielectric adjacent to the pillar. In another embodiment, the etch stop tier can comprise a blocking dielectric adjacent to the pillar, and a plurality of dielectric films horizontally extending from the blocking dielectric into the etch stop tier.
申请公布号 US9064970(B2) 申请公布日期 2015.06.23
申请号 US201313864794 申请日期 2013.04.17
申请人 Micron Technology, Inc. 发明人 Simsek-Ege Fatma Arzum;Hopkins John;Jayanti Srikant
分类号 H01L27/115;H01L29/792;H01L29/66 主分类号 H01L27/115
代理机构 Schwegman Lundberg & Woessner, P.A. 代理人 Schwegman Lundberg & Woessner, P.A.
主权项 1. A memory comprising: a vertical pillar coupled to a source; a dielectric etch stop tier over the source, the dielectric etch stop tier comprising a blocking dielectric adjacent to the pillar, and a plurality of dielectric films horizontally extending from the blocking dielectric into the dielectric etch stop tier and separating the dielectric etch stop tier into multiple dielectric tiers; and a stack of alternating dielectric tiers and conductive tiers over the dielectric etch stop tier.
地址 Boise ID US