发明名称 |
Memory including blocking dielectric in etch stop tier |
摘要 |
Vertical memories and methods of making the same are discussed generally herein. In one embodiment, a vertical memory can include a vertical pillar extending to a source, an etch stop tier over the source, and a stack of alternating dielectric tiers and conductive tiers over the etch stop tier. The etch stop tier can comprise a blocking dielectric adjacent to the pillar. In another embodiment, the etch stop tier can comprise a blocking dielectric adjacent to the pillar, and a plurality of dielectric films horizontally extending from the blocking dielectric into the etch stop tier. |
申请公布号 |
US9064970(B2) |
申请公布日期 |
2015.06.23 |
申请号 |
US201313864794 |
申请日期 |
2013.04.17 |
申请人 |
Micron Technology, Inc. |
发明人 |
Simsek-Ege Fatma Arzum;Hopkins John;Jayanti Srikant |
分类号 |
H01L27/115;H01L29/792;H01L29/66 |
主分类号 |
H01L27/115 |
代理机构 |
Schwegman Lundberg & Woessner, P.A. |
代理人 |
Schwegman Lundberg & Woessner, P.A. |
主权项 |
1. A memory comprising:
a vertical pillar coupled to a source; a dielectric etch stop tier over the source, the dielectric etch stop tier comprising a blocking dielectric adjacent to the pillar, and a plurality of dielectric films horizontally extending from the blocking dielectric into the dielectric etch stop tier and separating the dielectric etch stop tier into multiple dielectric tiers; and a stack of alternating dielectric tiers and conductive tiers over the dielectric etch stop tier. |
地址 |
Boise ID US |