| 发明名称 | Negative photosensitive resin composition, pattern formation method, and liquid discharge head | ||
| 摘要 | A photosensitive resin composition includes a cationically polymerizable compound, a photoacid generating agent having an anion portion and a cation portion, and a salt having a cation portion having either one of a quaternary ammonium structure and a quaternary phosphonium structure and an anion portion, wherein the anion portion of the salt is exchanged with the anion portion of a first acid derived from the anion portion of the photoacid generating agent to form a second acid having acid strength that is lower than acid strength of the first acid. | ||
| 申请公布号 | US9061499(B2) | 申请公布日期 | 2015.06.23 |
| 申请号 | US201113576906 | 申请日期 | 2011.01.27 |
| 申请人 | Canon Kabushiki Kaisha | 发明人 | Takahashi Hyo;Ikegame Ken;Shimomura Masako |
| 分类号 | G03C1/00;G03F7/00;G03F1/00;G01D11/00;B41J2/16;G03F7/004;G03F7/038 | 主分类号 | G03C1/00 |
| 代理机构 | Canon USA Inc. IP Division | 代理人 | Canon USA Inc. IP Division |
| 主权项 | 1. A photosensitive resin composition comprising: a cationically polymerizable compound; a photoacid generating agent having an anion portion and a cation portion; and a salt having a cation portion having either one of a quaternary ammonium structure and a quaternary phosphonium structure and an anion portion, wherein the anion portion of the salt is exchanged with the anion portion of a first acid derived from the anion portion of the photoacid generating agent to form a second acid having acid strength that is lower than acid strength of the first acid, wherein the photoacid generating agent includes a plurality of types of compounds, and a number of moles of the salt is larger than ¼ times of a number of moles of the photoacid generating agent generating the acid having the highest acid strength among the plurality of types of compounds. | ||
| 地址 | Tokyo JP | ||